Plating

Monitor major and minor elements simultaneously to improve performance

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Solutions for the Plating Industry

MICAP-OES 1000 provides low-cost monitoring of plating baths, for both major components as well as potential elemental contamination. Its multielement measurement capabilities delivers quick and accurate analysis results to allow timely monitoring of your plating solutions. No more performing single element titrations or waiting days/weeks for results after sending samples to an outside laboratory.

This innovated nitrogen-based plasma atomic spectroscopy instrument replaces the traditional argon generated plasma technology. MICAP-OES 1000 uses highly efficient Cerawave technology that replaces the water-cooled load coil found in commercially available ICP-OES instruments today and does not require air or water cooling. MICAP operates on 208-240 V power from regular outlets and industrial grade nitrogen (99.99%) that is much cheaper than argon. Nitrogen can be produced locally with a nitrogen generator which eliminates the problem of ongoing sourcing of gases.

Features & Benefits

What can our instruments do for you?

Use robust nitrogen plasma with superior matrix tolerance.
Simultaneous measurement for fast analysis times.
Smallest footprint and light-weight design.
Reduced running cost/analysis.

Easy-to-use Windows-based graphical user interface of RIS software package.
The ability to display, store and recall spectra for every sample analyzed data display and reprocessing, without the need to rerun samples (original data is unchanged).
Automated robust wavelength accuracy algorithm to ensure wavelength stability for extended sample runs.

The world's smallest ICP

Smarter. Faster. More efficient.

Radom’s proprietary Cerawave™ technology sets a new standard for productivity. Cerawave, an advanced ceramic ring, replaces water cooled coils and traditional RF generators. MICAP-OES 1000 is a powerful analytical instrument with a simple design eliminating the need for a chiller and permanent installation location.